PROPERTIES OF A-BORON FILMS PREPARED BY LOW-PRESSURE CHEMICAL VAPOR-DEPOSITION

被引：14
|
作者：
ONG, CW
CHIK, KP
WONG, HK
机构：
来源：
JOURNAL OF NON-CRYSTALLINE SOLIDS | 1989年 / 114卷
关键词：
D O I：
10.1016/0022-3093(89)90719-9
中图分类号：
TQ174 [陶瓷工业]; TB3 [工程材料学];
学科分类号：
0805 ; 080502 ;
摘要：
引用
收藏
页码：783 / 785
页数：3
相关论文
共 50 条
  • [1] PROPERTIES OF SILICON DIOXIDE FILMS PREPARED BY LOW-PRESSURE CHEMICAL VAPOR-DEPOSITION FROM TETRAETHYLORTHOSILICATE
    ROJAS, S
    MODELLI, A
    WU, WS
    BORGHESI, A
    PIVAC, B
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1990, 8 (06): : 1177 - 1184
  • [2] ALUMINUM FILMS PREPARED BY METAL ORGANIC LOW-PRESSURE CHEMICAL VAPOR-DEPOSITION
    GREEN, ML
    LEVY, RA
    NUZZO, RG
    COLEMAN, E
    THIN SOLID FILMS, 1984, 114 (04) : 367 - 377
  • [3] LOW-PRESSURE CHEMICAL VAPOR-DEPOSITION OF BPSG FILMS
    JENKINS, GM
    BULLERWELL, JM
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1985, 132 (09) : C405 - C405
  • [4] LOW-PRESSURE CHEMICAL VAPOR-DEPOSITION OF SIOX FILMS
    ABERNATHEY, J
    JOHNSON, D
    NESBIT, L
    CAMPBELL, D
    LAM, C
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1985, 132 (06) : C222 - C222
  • [5] LOW-PRESSURE CHEMICAL VAPOR-DEPOSITION
    HERSEE, SD
    DUCHEMIN, JP
    ANNUAL REVIEW OF MATERIALS SCIENCE, 1982, 12 : 65 - 80
  • [6] LOW-PRESSURE CHEMICAL VAPOR-DEPOSITION
    GIESKE, RJ
    MCMULLEN, JJ
    DONAGHEY, LF
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1977, 124 (08) : C296 - C296
  • [7] THIN TIO2 FILMS PREPARED BY LOW-PRESSURE CHEMICAL VAPOR-DEPOSITION
    RAUSCH, N
    BURTE, EP
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1993, 140 (01) : 145 - 149
  • [8] MICROSTRUCTURE OF BORON-DOPED SILICON LAYERS PREPARED BY LOW-PRESSURE CHEMICAL VAPOR-DEPOSITION
    BIELLEDASPET, D
    MANSOURBAHLOUI, F
    MARTINEZ, A
    PIERAGGI, B
    DAVID, MJ
    DEMAUDUIT, B
    OUSTRY, A
    CARLES, R
    LANDA, G
    AJUSTRON, F
    MAZEL, A
    RIBOULET, P
    THIN SOLID FILMS, 1987, 150 (01) : 69 - 82
  • [9] CHEMICAL VAPOR-DEPOSITION AT LOW-PRESSURE IN THE IRON-BORON SYSTEM
    ARMAS, B
    MORALES, M
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1979, 126 (08) : C354 - C354
  • [10] CHEMICAL VAPOR-DEPOSITION AT LOW-PRESSURE IN SILICON-BORON SYSTEM
    ARMAS, B
    COMBESCURE, C
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1977, 124 (08) : C296 - C296
12345