STRUCTURAL CHARACTERISTICS OF ELECTRON-CYCLOTRON-RESONANCE CHEMICAL-VAPOR-DEPOSITION SIC COATINGS

被引：0
|
作者：
QADRI, SB
SKELTON, EF
SHIMKUNAS, AR
BUTLER, JE
机构：
[1] US Naval Research Laboratory, Washington
来源：
SURFACE & COATINGS TECHNOLOGY | 1993年 / 61卷 / 1-3期
关键词：
D O I：
10.1016/0257-8972(93)90250-R
中图分类号：
TB3 [工程材料学];
学科分类号：
0805 ; 080502 ;
摘要：
SiC films 0.2-2.0 mum thick have been characterized structurally by X-ray diffraction techniques. The films were deposited by electron cyclotron resonance-chemical vapor deposition techniques. No evidence of crystallinity was observed for films with thicknesses less than 1 mum; these are presumed to be amorphous. Thicker films were found to have crystallized predominantly in the a phase of SiC.
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页码：346 / 348
页数：3
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