SILICON OXIDATION STUDIES - SOME ASPECTS OF INITIAL OXIDATION REGIME

[11] Silicon Oxidation Studies: The Role of H2O [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1977, 124 (11) : 1757 - 1761

[12] EFFECTS OF TRACE AMOUNTS OF WATER ON THERMAL OXIDATION OF SILICON IN OXYGEN [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1974, 121 (12) : 1613 - 1616

[13] SOME PROPERTIES OF CHEMICALLY VAPOR-DEPOSITED FILMS OF A1XOYNZ ON SILICON [J]. JOURNAL OF ELECTRONIC MATERIALS, 1975, 4 (03) : 409 - 427

[14] SILICON OXIDATION STUDIES - ANALYSIS OF SIO2 FILM GROWTH DATA [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1976, 123 (09) : 1380 - 1384

[15] LEE RW, 1964, PHYS CHEM GLASSES-B, V5, P35

[16] ACCELERATED DIELECTRIC BREAKDOWN OF SILICON DIOXIDE FILMS [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1973, 120 (10) : 1377 - 1384

[17] DIELECTRIC BREAKDOWN IN SILICON DIOXIDE FILMS ON SILICON .1. MEASUREMENT AND INTERPRETATION [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1972, 119 (05) : 591 - +

[18] ELECTRICAL-CONDUCTION AND DIELECTRIC BREAKDOWN IN SILICON DIOXIDE FILMS ON SILICON [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1972, 119 (05) : 603 - +

[19] DIELECTRIC BREAKDOWN IN SILICON DIOXIDE FILMS ON SILICON .2. INFLUENCE OF PROCESSING AND MATERIALS [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1972, 119 (05) : 597 - +

[20] NITROGEN REACTION AT A SILICON-SILICON DIOXIDE INTERFACE [J]. APPLIED PHYSICS LETTERS, 1975, 27 (03) : 150 - 152

[11] Silicon Oxidation Studies: The Role of H2O [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1977, 124 (11) : 1757 - 1761

[12] EFFECTS OF TRACE AMOUNTS OF WATER ON THERMAL OXIDATION OF SILICON IN OXYGEN [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1974, 121 (12) : 1613 - 1616

[13] SOME PROPERTIES OF CHEMICALLY VAPOR-DEPOSITED FILMS OF A1XOYNZ ON SILICON [J]. JOURNAL OF ELECTRONIC MATERIALS, 1975, 4 (03) : 409 - 427

[14] SILICON OXIDATION STUDIES - ANALYSIS OF SIO2 FILM GROWTH DATA [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1976, 123 (09) : 1380 - 1384

[15] LEE RW, 1964, PHYS CHEM GLASSES-B, V5, P35

[16] ACCELERATED DIELECTRIC BREAKDOWN OF SILICON DIOXIDE FILMS [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1973, 120 (10) : 1377 - 1384

[17] DIELECTRIC BREAKDOWN IN SILICON DIOXIDE FILMS ON SILICON .1. MEASUREMENT AND INTERPRETATION [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1972, 119 (05) : 591 - +

[18] ELECTRICAL-CONDUCTION AND DIELECTRIC BREAKDOWN IN SILICON DIOXIDE FILMS ON SILICON [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1972, 119 (05) : 603 - +

[19] DIELECTRIC BREAKDOWN IN SILICON DIOXIDE FILMS ON SILICON .2. INFLUENCE OF PROCESSING AND MATERIALS [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1972, 119 (05) : 597 - +

[20] NITROGEN REACTION AT A SILICON-SILICON DIOXIDE INTERFACE [J]. APPLIED PHYSICS LETTERS, 1975, 27 (03) : 150 - 152