FABRICATION OF 3.5-GHZ SURFACE ACOUSTIC-WAVE FILTERS BY ION PROJECTION LITHOGRAPHY

被引：10

作者：

BRUNGER, WH

BUCHMANN, LM

KREUTZER, M

TORKLER, M

ZWICKER, G

FLEISCHMANN, B

机构：

[1] Siemens AG, D-8000 München 83

来源：

MICROELECTRONIC ENGINEERING | 1992年 / 17卷 / 1-4期

关键词：

D O I：

10.1016/0167-9317(92)90049-W

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

By applying ion projection lithography an SAW device with 0.3-mu-m lines and spaces has been printed on a quartz substrate. The problem of complementary masks connected with the use of open stencil masks was solved in this special situation of a linear design by an exposure technique with subsequent stepping in the direction of the lines. The device was characterized by its filter response curve displaying the strongest band pass at 1.5 GHz.

引用

页码：245 / 248

页数：4

共 7 条

[1]

Yoshioka, Sakai, Morimoto, Hosono, Watakabe, Wadaka, Fabrication of surface acoustic wave devices by using x-ray lithography, Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 7 B, (1989)

[2]

Blok, Visser, van der Drift, Romijn, Venema, High-resolution technology for silicon-integrated surface acoustic wave devices, Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 7 B, (1989)

[3]

Stumbo, Sen, Fong, Damm, Engler, Wolfe, 35th Intern. Symp. Electron, Ion & Photon Beams, 35th Intern. Symp. Electron, Ion & Photon Beams, (1991)

[4]

Heuberger, Buchmann, Csepregi, Muller, Microcircuit Engineering, 3, (1986)

[5]

Stengl, Loschner, Hammel, Wolf, Proceed. ESSDERC, (1987)

[6]

Stengl, Loschner, Maurer, Wolf, MRS Fall Meeting, (1984)

[7]

Randall, Flanders, Economou, Donelly, Bromley, Masked ion beam resist exposure using grid support stencil masks, Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 3 B, (1985)

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