FABRICATION OF 3.5-GHZ SURFACE ACOUSTIC-WAVE FILTERS BY ION PROJECTION LITHOGRAPHY

被引：9
作者：
BRUNGER, WH
BUCHMANN, LM
KREUTZER, M
TORKLER, M
ZWICKER, G
FLEISCHMANN, B
机构：
[1] Siemens AG, D-8000 München 83
来源：
MICROELECTRONIC ENGINEERING | 1992年 / 17卷 / 1-4期
关键词：
D O I：
10.1016/0167-9317(92)90049-W
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
By applying ion projection lithography an SAW device with 0.3-mu-m lines and spaces has been printed on a quartz substrate. The problem of complementary masks connected with the use of open stencil masks was solved in this special situation of a linear design by an exposure technique with subsequent stepping in the direction of the lines. The device was characterized by its filter response curve displaying the strongest band pass at 1.5 GHz.
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页码：245 / 248
页数：4
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