ENABLING DISPERSED INNOVATION - HOW THE UNITED STATES CAN UTILIZE ITS LONG TAIL OF TALENT

被引:2
作者
Ramachandran, Raja [1 ]
机构
[1] Intel Capital, 2200 Mission Coll Blvd,MS RN6-37, Santa Clara, CA 95054 USA
关键词
Dispersed innovation; venture capital; cost of living; US education; entrepreneurship; technology leadership;
D O I
10.1142/S0219877012500071
中图分类号
C93 [管理学];
学科分类号
12 ; 1201 ; 1202 ; 120202 ;
摘要
The United States, having enjoyed nearly half a century of technology leadership, today faces a number of challenges in maintaining its innovation advantage. These include: (1) Declining science and engineering talent pipeline, (2) increased global competition, (3) rigidity of the venture capital model, and (4) saturation of key technology centers. In a period where all Science Engineering (S&E) talent is not necessarily deployed to S&E occupations due to other opportunities or geographical challenges, "Dispersed Innovation," the idea of a location independent model to achieve higher technical utilization of American S&E talent is a proposed solution which consists of four key components: (1) Build out of advanced transportation networks, (2) increased use of collaboration tools, (3) cultural acceptance of entrepreneurship, and (4) increased funding options and models.
引用
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页数:23
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