ION-DOSE DEPENDENCE OF THE SPUTTERING YIELD OF RU(0001) AT VERY LOW FLUENCES

被引：31
作者：
BURNETT, JW
PELLIN, MJ
CALAWAY, WF
GRUEN, DM
YATES, JT
机构：
[1] ARGONNE NATL LAB,DIV CHEM,ARGONNE,IL 60439
[2] ARGONNE NATL LAB,DIV MAT SCI,ARGONNE,IL 60439
来源：
PHYSICAL REVIEW LETTERS | 1989年 / 63卷 / 05期
关键词：
D O I：
10.1103/PhysRevLett.63.562
中图分类号：
O4 [物理学];
学科分类号：
0702 ;
摘要：
引用
收藏
页码：562 / 565
页数：4
相关论文
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