ION-DOSE DEPENDENCE OF THE SPUTTERING YIELD OF RU(0001) AT VERY LOW FLUENCES

被引：31

作者：

BURNETT, JW

PELLIN, MJ

CALAWAY, WF

GRUEN, DM

YATES, JT

机构：

[1] ARGONNE NATL LAB,DIV CHEM,ARGONNE,IL 60439

[2] ARGONNE NATL LAB,DIV MAT SCI,ARGONNE,IL 60439

来源：

PHYSICAL REVIEW LETTERS | 1989年 / 63卷 / 05期

关键词：

D O I：

10.1103/PhysRevLett.63.562

中图分类号：

O4 [物理学];

学科分类号：

0702 ;

摘要：

引用

页码：562 / 565

页数：4

共 17 条

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[9]

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[10] ENERGY-DEPENDENCE OF ANGULAR-DISTRIBUTIONS OF SPUTTERED PARTICLES BY ION-BEAM BOMBARDMENT AT NORMAL INCIDENCE [J].

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