ION-BEAM SHADOW PRINTING THROUGH THIN SILICON FOILS USING CHANNELING

被引：16

作者：

CSEPREGI, L

IBERL, F

EICHINGER, P

机构：

来源：

APPLIED PHYSICS LETTERS | 1980年 / 37卷 / 07期

关键词：

D O I：

10.1063/1.92001

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：630 / 632

页数：3

共 14 条

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[4]

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[8]

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[9]

MEEK RL, 1971, RADIAT EFF, V11, P139

[10] ION-BEAM LITHOGRAPHY FOR IC-FABRICATION WITH SUBMICROMETER FEATURES [J].

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