A WAFER-SCALE-LEVEL SYSTEM INTEGRATED LSI CONTAINING 11 4-MB DRAMS, 6 64-KB SRAMS, AND AN 18K-GATE ARRAY

被引:2
作者
SATO, K [1 ]
KOBAYASHI, M [1 ]
HIDA, H [1 ]
MIYAZAWA, H [1 ]
SHIRAI, Y [1 ]
FUJITA, K [1 ]
NAKAO, T [1 ]
ISHIHARA, M [1 ]
机构
[1] HITACHI LTD,ODAWARA WORKS,ODAWARA,KANAGAWA 256,JAPAN
关键词
D O I
10.1109/4.165342
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
As DRAM capacity and density increase, DRAM is becoming more than a simple large-capacity memory; it is evolving into an application-specific memory system containing control logic or a high-speed cache memory. This paper describes a system integrated LSI chip (SLSI) that contains eleven 4-Mb DRAM's, six 64-kb SRAM's, and an 18K-gate array, for a graphics application system. To implement the SLSI on a silicon chip, three new key techniques are developed: 1) system redundancy for defect relief, 2) chip configuration and fabrication with blade masking to achieve a hybrid 38.16 x 50.4-mm2 chip, and 3) large-capability and high-reliability 324-pin 54 x 86-mm2 plastic pin grid array package. Using a system redundancy technique, a 60% yield for the SLSI is achieved with a 40% yield for the DRAM itself. That is twice the 30% yield of the conventional repair scheme. Access times are 65 ns for the DRAM and 14 ns for the SRAM, with a 3.9-W chip power dissipation.
引用
收藏
页码:1608 / 1613
页数:6
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YAMASHITA, K ;
KANASUGI, A ;
HIJIYA, S ;
GOTO, G ;
MATSUMURA, N ;
SHIRATO, T .
IEEE JOURNAL OF SOLID-STATE CIRCUITS, 1988, 23 (02) :336-342