PHOTOCONDUCTIVITY OF ERBIUM-DOPED GERMANIUM

被引:0
作者
NAVARRO, H
TIMUSK, T
DATARS, WR
HOUGHTON, DC
机构
[1] MCMASTER UNIV,DEPT PHYS,HAMILTON,ON L8S 4M1,CANADA
[2] NATL RES COUNCIL CANADA,DIV PHYS,OTTAWA,ON K1A 0R6,CANADA
来源
APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING | 1994年 / 59卷 / 04期
关键词
D O I
10.1007/BF00331714
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
We have applied the technique of PhotoThermal Ionization Spectroscopy (PTIS) to the study of an erbium-doped p-Ge epitaxial layer, grown by MBE on an undoped n-type germanium substrate. The Er-doped Ge layer shows continuum photoconductivity response in the far-infrared region extending from 70 cm-1 to 900 cm-1. This type of epitaxial Er-doped Ge layers is a potentially attractive system for photoconductivity detectors of far-infrared radiation. Below 900 cm-1 three acceptor-like charged states can be distinguished with ionization energies of 9, 26.6 and greater-than-or-equal-to 50 meV. Additionally, a study of the photoconductive response of the same sample for radiation from 1000 cm-1 to 10000 cm-1, i.e., for radiation energies well inside the forbidden gap to energies above it, shows a wealth of levels, some of which have previously been associated with erbium.
引用
收藏
页码:373 / 379
页数:7
相关论文
共 18 条
[1]   CUBIC CONTRIBUTIONS TO SPHERICAL MODEL OF SHALLOW ACCEPTOR STATES [J].
BALDERES.A ;
LIPARI, NO .
PHYSICAL REVIEW B, 1974, 9 (04) :1525-1539
[2]  
Bratt P. R., 1977, SEMICONDUCT SEMIMET, V12, P39
[3]   ENERGY-LEVELS IN SILICON [J].
CHEN, JW ;
MILNES, AG .
ANNUAL REVIEW OF MATERIALS SCIENCE, 1980, 10 :157-228
[4]   1.54-MU-M LUMINESCENCE OF ERBIUM-IMPLANTED III-V SEMICONDUCTORS AND SILICON [J].
ENNEN, H ;
SCHNEIDER, J ;
POMRENKE, G ;
AXMANN, A .
APPLIED PHYSICS LETTERS, 1983, 43 (10) :943-945
[5]   1.54-MU-M ELECTROLUMINESCENCE OF ERBIUM-DOPED SILICON GROWN BY MOLECULAR-BEAM EPITAXY [J].
ENNEN, H ;
POMRENKE, G ;
AXMANN, A ;
EISELE, K ;
HAYDL, W ;
SCHNEIDER, J .
APPLIED PHYSICS LETTERS, 1985, 46 (04) :381-383
[6]   PHOTOLUMINESCENCE EXCITATION MEASUREMENTS ON GAAS-ER GROWN BY MOLECULAR-BEAM EPITAXY [J].
ENNEN, H ;
WAGNER, J ;
MULLER, HD ;
SMITH, RS .
JOURNAL OF APPLIED PHYSICS, 1987, 61 (10) :4877-4879
[7]   IMPACT EXCITATION OF THE ERBIUM-RELATED 1.54 MU-M LUMINESCENCE PEAK IN ERBIUM-DOPED INP [J].
ISSHIKI, H ;
KOBAYASHI, H ;
YUGO, S ;
KIMURA, T ;
IKOMA, T .
APPLIED PHYSICS LETTERS, 1991, 58 (05) :484-486
[8]   PHOTOTHERMAL IONIZATION SPECTROSCOPY OF SELECTIVELY BORON-DOPED GEXSI(1-X)-SI STRAINED-LAYER HETEROSTRUCTURES [J].
JANG, HF ;
DATARS, WR ;
TIMUSK, T ;
BEREZIN, AA ;
HOUGHTON, DC .
CANADIAN JOURNAL OF PHYSICS, 1989, 67 (04) :321-325
[9]   PHOTOELECTRIC SPECTROSCOPY - NEW METHOD OF ANALYSIS OF IMPURITIES IN SEMICONDUCTORS [J].
KOGAN, SM ;
LIFSHITS, TM .
PHYSICA STATUS SOLIDI A-APPLIED RESEARCH, 1977, 39 (01) :11-39
[10]  
Milnes A. G., 1973, DEEP IMPURITIES SEMI