A THEORETICAL-MODEL OF THE FORMATION MORPHOLOGIES OF POROUS SILICON

被引:147
作者
SMITH, RL [1 ]
CHUANG, SF [1 ]
COLLINS, SD [1 ]
机构
[1] MIT,DEPT MAT SCI & ENGN,CAMBRIDGE,MA 02139
关键词
D O I
10.1007/BF02652104
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
引用
收藏
页码:533 / 541
页数:9
相关论文
共 26 条
[1]   FORMATION AND PROPERTIES OF POROUS SILICON FILM [J].
ARITA, Y ;
SUNOHARA, Y .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1977, 124 (02) :285-295
[3]   AN EXPERIMENTAL AND THEORETICAL-STUDY OF THE FORMATION AND MICROSTRUCTURE OF POROUS SILICON [J].
BEALE, MIJ ;
BENJAMIN, JD ;
UREN, MJ ;
CHEW, NG ;
CULLIS, AG .
JOURNAL OF CRYSTAL GROWTH, 1985, 73 (03) :622-636
[4]  
FAUST JW, 1983, J ELECTROCHEM SOC, V130, P14013
[5]  
FRYE RC, 1984, P MATERIAL RES SOC S, V33, P53
[6]  
Ghandhi S.K, 1995, VLSI FABRICATION PRI
[7]   STUDIES ON POROUS AL2O3 GROWTH .1. PHYSICAL MODEL [J].
HEBER, KV .
ELECTROCHIMICA ACTA, 1978, 23 (02) :127-133
[8]   POROSITY AND PORE-SIZE DISTRIBUTIONS OF POROUS SILICON LAYERS [J].
HERINO, R ;
BOMCHIL, G ;
BARLA, K ;
BERTRAND, C ;
GINOUX, JL .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1987, 134 (8A) :1994-2000
[10]   ANODIC DISSOLUTION OF N+ SILICON [J].
MEEK, RL .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1971, 118 (03) :437-&