COMPLEMENTARY X-RAY TOPOGRAPHY AND NEAR-SURFACE DIFFRACTION FOR INVESTIGATIONS INTO THE STRUCTURE OF ION-IMPLANTED OPTICAL WAVE-GUIDES

被引：7

作者：

LOWTHERHARRIS, RS

BROWN, SD

HAYCOCK, PW

CHANDLER, PJ

ZHANG, L

TANG, CC

FINDLAY, RP

BABSAIL, L

RODMAN, M

KNIGHT, J

TOWNSEND, PD

机构：

[1] SERC,DARESBURY LAB,DRAL,WARRINGTON WA4 4AD,CHESHIRE,ENGLAND

[2] UNIV SUSSEX,SCH MATH & PHYS SCI,FALMER BN1 9QH,E SUSSEX,ENGLAND

来源：

NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS | 1995年 / 97卷 / 1-4期

基金：

英国工程与自然科学研究理事会;

关键词：

D O I：

10.1016/0168-583X(94)00394-7

中图分类号：

TH7 [仪器、仪表];

学科分类号：

0804 ; 080401 ; 081102 ;

摘要：

Ion implantation is now a well established technique for the production of optical waveguides for integrated optics applications. However, in some materials, such as lithium niobate, it leads to anomalous optical properties in the waveguiding region. We have investigated the structure of the waveguide and the damaged region in ion-implanted lithium niobate by carrying out complementary X-ray topography and near surface X-ray diffraction on etched crystals. The results indicate radiation enhanced annealing in the waveguide itself and the upper region of the substrate, as well as a high degree of amorphisation in the damaged layer.

引用

收藏

页码：337 / 341

页数：5

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