EFFECT OF CHEMICAL COMPOSITION UPON THE RADIATION AND ELECTRON-BEAM RESIST BEHAVIORS OF VINYL-POLYMERS

被引：11
作者：
HELBERT, JN
IAFRATE, GJ
PITTMAN, CU
LAI, JH
机构：
[1] UNIV ALABAMA,BIRMINGHAM,AL 35233
[2] HONEYWELL INC,CTR MAT SCI,BLOOMINGTON,MN 55420
来源：
POLYMER ENGINEERING AND SCIENCE | 1980年 / 20卷 / 16期
关键词：
D O I：
10.1002/pen.760201608
中图分类号：
TQ [化学工业];
学科分类号：
0817 ;
摘要：
引用
收藏
页码：1077 / 1081
页数：5
相关论文
共 21 条
[1]   THE DEGRADATION OF SOLID POLYMETHYLMETHACRYLATE BY IONIZING RADIATION [J].
ALEXANDER, P ;
CHARLESBY, A ;
ROSS, M .
PROCEEDINGS OF THE ROYAL SOCIETY OF LONDON SERIES A-MATHEMATICAL AND PHYSICAL SCIENCES, 1954, 223 (1154) :392-404
[2]   RADIATION INDUCED CHANGES IN THE STRUCTURE OF POLYISOBUTYLENE [J].
ALEXANDER, P ;
BLACK, RM ;
CHARLESBY, A .
PROCEEDINGS OF THE ROYAL SOCIETY OF LONDON SERIES A-MATHEMATICAL AND PHYSICAL SCIENCES, 1955, 232 (1188) :31-48
[3]   BACK SCATTERING OF ELECTRONS [J].
ARCHARD, GD .
JOURNAL OF APPLIED PHYSICS, 1961, 32 (08) :1505-&
[4]  
Bethe H, 1930, ANN PHYS-BERLIN, V5, P325
[5]  
Bethe H. A., 1938, P AM PHILOS SOC, V78, P573
[6]  
BETHE HA, 1959, EXPT NUCLEAR PHYSICS, V2
[7]  
Chapiro A, 1962, RAD CHEM POLYMERIC S
[8]  
CHEN CY, J POLYM SCI PC
[9]   POLY(METHYL METHACRYLATE-ISOBUTYLENE) COPOLYMERS AS HIGHLY SENSITIVE ELECTRON-BEAM RESISTS [J].
GIPSTEIN, E ;
MOREAU, W ;
NEED, O .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1976, 123 (07) :1105-1109
[10]   COPOLYMERS OF METHYL-METHACRYLATE AND METHACRYLIC-ACID AND THEIR METAL-SALTS AS RADIATION SENSITIVE RESISTS [J].
HALLER, I ;
FEDER, R ;
HATZAKIS, M ;
SPILLER, E .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1979, 126 (01) :154-161
123