ION CLUSTER BEAM DEPOSITION OF SILVER AND GERMANIUM ON SILICON

被引：40
作者：
KUIPER, AET
THOMAS, GE
SCHOUTEN, WJ
机构：
来源：
JOURNAL OF CRYSTAL GROWTH | 1981年 / 51卷 / 01期
关键词：
D O I：
10.1016/0022-0248(81)90005-1
中图分类号：
O7 [晶体学];
学科分类号：
0702 ; 070205 ; 0703 ; 080501 ;
摘要：
引用
收藏
页码：17 / 40
页数：24
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