MONOLAYER ABRUPTNESS IN HIGHLY STRAINED INASXP1-X/INP QUANTUM WELL INTERFACES

被引:28
作者
SCHNEIDER, RP [1 ]
WESSELS, BW [1 ]
机构
[1] NORTHWESTERN UNIV,MAT RES CTR,EVANSTON,IL 60208
关键词
D O I
10.1063/1.100742
中图分类号
O59 [应用物理学];
学科分类号
摘要
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页码:1142 / 1144
页数:3
相关论文
共 24 条
[21]   EXTREMELY HIGH-QUALITY GA0.47IN0.53AS/INP QUANTUM-WELLS GROWN BY CHEMICAL BEAM EPITAXY [J].
TSANG, WT ;
SCHUBERT, EF .
APPLIED PHYSICS LETTERS, 1986, 49 (04) :220-222
[22]   HETEROEPITAXIAL GROWTH OF HIGH MOBILITY INASP FROM THE VAPOR-PHASE [J].
WANG, PJ ;
WESSELS, BW .
APPLIED PHYSICS LETTERS, 1984, 44 (08) :766-768
[23]   ATOMIC STEPS AT GALNAS/INP INTERFACES GROWN BY ORGANOMETALLIC VAPOR-PHASE EPITAXY [J].
WANG, TY ;
FRY, KL ;
PERSSON, A ;
REIHLEN, EH ;
STRINGFELLOW, GB .
APPLIED PHYSICS LETTERS, 1988, 52 (04) :290-292
[24]  
YABLANOVITCH E, 1986, IEEE J LIGHTWAVE TEC, V4, P504