EVALUATION OF A CESIUM POSITIVE-ION SOURCE FOR SECONDARY ION MASS-SPECTROMETRY

被引：315

作者：

STORMS, HA ^{[1
]}

BROWN, KF ^{[1
]}

STEIN, JD ^{[1
]}

机构：

[1] GE,VALLECITOS NUCL CTR,PLEASANTON,CA 94566

来源：

ANALYTICAL CHEMISTRY | 1977年 / 49卷 / 13期

关键词：

D O I：

10.1021/ac50021a034

中图分类号：

O65 [分析化学];

学科分类号：

070302 ; 081704 ;

摘要：

引用

页码：2023 / 2030

页数：8

共 18 条

[1]

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[2]

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[3]

BESKE HE, 1962, Z ANGEW PHYS, V14, P30

[4]

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[7]

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[8] MECHANISM FOR NEGATIVE-ION PRODUCTION IN SURFACE-PLASMA NEGATIVE-HYDROGEN-ION SOURCE [J].

HISKES, JR ;

KARO, A ;

GARDNER, M .

JOURNAL OF APPLIED PHYSICS, 1976, 47 (09) :3888-3896

[9] EMISSION OF NEGATIVE IONS FROM METAL SURFACES BOMBARDED BY POSITIVE CESIUM IONS [J].

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JOURNAL OF APPLIED PHYSICS, 1962, 33 (12) :3523-&

[10] ION MICROPROBE MASS ANALYZER [J].

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