Observation of organic thin film surface by atomic force microscopy

被引：0
作者：
Wang, GM
Ding, DS
Lu, ZH
Yu, W
Ding, Y
机构：
[1] CTR ADV STUDIES SCI & TECHNOL MICROSTRUCT,NANJING 210093,PEOPLES R CHINA
[2] SE UNIV,DEPT ELECTR ENGN,NANJING 210096,PEOPLES R CHINA
来源：
CHEMICAL JOURNAL OF CHINESE UNIVERSITIES-CHINESE | 1995年 / 16卷 / 11期
关键词：
8-hydroxyquinoline neodymium; thin film; atomic force microscopy;
D O I：
暂无
中图分类号：
O6 [化学];
学科分类号：
0703 ;
摘要：
The 8-hydroxyquinoline neodymium (Ndq3) organic thin films deposited on the cleaned indium/tin oxide (ITO) at different deposition rates with the same vacuity (133.3X10(-5) Pa) were revealed by atomic force microscopy (AFM). Organic devices with one layer of Ndq3 as the e-type conductive material at different deposition rates sandwiched between ITO and aluminum electrodes have been fabricated, respectively. Evidence suggests that the current-voltage (I-V) characteristics were determined by the uniformity of organic film which was controlled by the deposition conditions.
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页码：112 / 115
页数：4
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