DEEP-ACCEPTOR-MEDIATED PHOTOQUENCHING OF THE MIDGAP DONOR EL2 IN SEMIINSULATING GAAS

被引:18
|
作者
SUEMITSU, M
TAKAHASHI, H
MIYAMOTO, N
机构
[1] Research Institute of Electrical Communication, Tohoku University, Aoba-ku, Sendai 980
来源
PHYSICAL REVIEW B | 1995年 / 52卷 / 03期
关键词
D O I
10.1103/PhysRevB.52.1666
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The effects of lowering the temperature and/or adding shallow accepters in semi-insulating GaAs on the photoquenching effect of the midgap donor EL2 have been extensively studied. Measurements were made on the near-infrared photoabsorption and the photocurrent at T = 8.6-130 K for various samples containing different concentrations of carbon accepters ranging from 1.8 X 10(15) to 14.3 X 10(15) cm(-3). The results indicate a strong influence of the two parameters on the photoquenching; the photoquenching was more enhanced both at lower quenching temperatures and at higher carbon concentrations. The results were consistently explained by assuming a deep-acceptor level located at E(v) + (70-80) meV, which triggers the onset of EL2 photoquenching when it is neutral, while it triggers the onset of EL2 photorecovery when it is negatively ionized.
引用
收藏
页码:1666 / 1673
页数:8
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