PREPARATIONS OF A-SI-H FROM HIGHER SILANES (SINH2N+2) WITH THE HIGH GROWTH-RATE

被引：34

作者：

OGAWA, K

SHIMIZU, I

INOUE, E

机构：

来源：

关键词：

D O I：

10.1143/JJAP.20.L639

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：L639 / L642

页数：4

共 7 条

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[5]

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[6]

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SHIMIZU, I ;

KOMATSU, T ;

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INOUE, E .