OPTICAL SPECTROSCOPY IN REACTIVE SPUTTER ETCHING AND ITS APPLICATION TO PROCESS-CONTROL

被引：7

作者：

OSHIMA, M

机构：

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS | 1981年 / 20卷 / 04期

关键词：

D O I：

10.1143/JJAP.20.683

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：683 / 690

页数：8

共 50 条

[1] OPTICAL SPECTROSCOPY FOR DIAGNOSTICS AND PROCESS-CONTROL DURING GLOW-DISCHARGE ETCHING AND SPUTTER DEPOSITION
GREENE, JE
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1978, 15 (05): : 1718 - 1729
[2] ACTIVE PROCESS-CONTROL OF REACTIVE SPUTTER DEPOSITION
VOEVODIN, AA
STEVENSON, P
REBHOLZ, C
SCHNEIDER, JM
MATTHEWS, A
VACUUM, 1995, 46 (07) : 723 - 729
[3] REACTIVE SPUTTER ETCHING AND ITS APPLICATIONS
SOMEKH, S
PROCEEDINGS OF THE SOCIETY OF PHOTO-OPTICAL INSTRUMENTATION ENGINEERS, 1982, 334 : 175 - 180
[4] REACTIVE SPUTTER ETCHING AND ITS APPLICATIONS
WANG, DNK
MAYDAN, D
LEVINSTEIN, HJ
SOLID STATE TECHNOLOGY, 1980, 23 (08) : 122 - 126
[5] PROFILE CONTROL BY REACTIVE SPUTTER ETCHING
LEHMANN, HW
WIDMER, R
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1978, 15 (02): : 319 - 326
[6] APPLICATION OF OPTICAL MEASUREMENT SYSTEM FOR LITHOGRAPHIC PROCESS-CONTROL
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HAMASHIMA, M
YAMAGUCHI, T
PRECISION ENGINEERING-JOURNAL OF THE AMERICAN SOCIETY FOR PRECISION ENGINEERING, 1990, 12 (01): : 49 - 54
[7] IMPLEMENTATION OF ADAPTIVE PROCESS-CONTROL TO A DRY ETCHING PROCESS
BRESNOCK, FJ
STUMPF, T
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1982, 20 (04): : 1027 - 1030
[8] ONLINE SPECTROSCOPY FOR PROCESS-CONTROL
LYTLE, D
PHOTONICS SPECTRA, 1995, 29 (07) : 44 - 44
[9] LASER DIAGNOSTIC-TECHNIQUES FOR REACTIVE ION ETCHING - PLASMA UNDERSTANDING TO PROCESS-CONTROL
SELWYN, GS
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1988, 6 (03): : 2041 - 2046
[10] PROCESS-CONTROL WITH OPTICAL-EMISSION SPECTROSCOPY IN TRIODE ION PLATING
SALMENOJA, K
KORHONEN, AS
SULONEN, MS
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1985, 3 (06): : 2364 - 2367

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