MICROMETHOD OF SURFACE-ROUGHNESS MEASUREMENT WITH SEM

被引：0

作者：

NG, WY ^{[1
]}

CHAN, KD ^{[1
]}

LAU, MK ^{[1
]}

机构：

[1] POLYTECH HONG KONG,FAC SCI & TECHNOL,LAB CTR,HONG KONG,HONG KONG

来源：

PLATING AND SURFACE FINISHING | 1993年 / 80卷 / 07期

关键词：

D O I：

暂无

中图分类号：

TF [冶金工业];

学科分类号：

0806 ;

摘要：

A method that makes use of the scanning electro microscope has been developed to measure the roughness of a microscopic sample, such as the top of a connecting post of a TO-5 semiconductor package. The electron beam of the SEM scans along a surface The intensity of emitted secondary electrons, while reveal the surface profile, is recorded on a photographic plate. The resulting curve is digitized and the roughness is estimated. The results obtained by this method compare favorably with the conventional profilometric method.

引用

页码：48 / 50

页数：3