APPLICATION OF A COMPUTER-MODEL FOR DETERMINING THE CONTRIBUTION OF THE FUNDAMENTAL CONDUCTION MECHANISMS IN DISCONTINUOUS METAL-FILMS ALUMINUM ON NACL

A computer model is developed that enables resistance calculations for a discontinuous film on a dielectric substrate. The advantage of the model is the inclusion of such mechanisms as metal conduction, substrate conduction, tunnelling and thermally activated tunnelling. The computer-modelled film structure is equivalent to a real structure determined by microscopic examinations. The resistance is calculated in terms of a specific algorithm. Making use of the computer method, the temperature dependence of the resistance as well as the relationship between log(resistance) and coverage coefficient for discontinuous aluminium films on NaCl are calculated. The agreement between calculated and measured data is good. © 1990.