DESIGN OF A VARIABLE-APERTURE PROJECTION AND SCANNING SYSTEM FOR ELECTRON-BEAM

被引：43
作者：
GOTO, E
SOMA, T
IDESAWA, M
机构：
来源：
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1978年 / 15卷 / 03期
关键词：
Compendex;
D O I：
10.1116/1.569620
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
ELECTRON OPTICS
引用
收藏
页码：883 / 886
页数：4
相关论文
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[3]  
Ohiwa H, 1971, T I ELECTRON COMMUN, V54-B, P730
[4]   NEW IMAGING AND DEFLECTION CONCEPT FOR PROBE-FORMING MICROFABRICATION SYSTEMS [J].
PFEIFFER, HC .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1975, 12 (06) :1170-1173
[5]  
SOMA T, 1977, OPTIK, V49, P255
[6]  
SOMA T, 1973, J INFORM P SOC JAPAN, V14, P218
[7]  
Yourke H. S., 1976, International Electron Devices Meeting. (Technical digest), P431
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