ULTRATHIN GATE OXIDES FORMED BY CATALYTIC-OXIDATION OF SILICON

被引：47

作者：

OELLIG, EM

MICHEL, EG

ASENSIO, MC

MIRANDA, R

机构：

来源：

APPLIED PHYSICS LETTERS | 1987年 / 50卷 / 23期

关键词：

D O I：

10.1063/1.97760

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：1660 / 1662

页数：3

共 16 条

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[6]

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