LINE-PROFILE RESIST DEVELOPMENT SIMULATION TECHNIQUES

被引:117
作者
JEWETT, RE
HAGOUEL, PI
NEUREUTHER, AR
VANDUZER, T
机构
[1] UNIV CALIF BERKELEY,DEPT ELECT ENGN & COMP SCI,BERKELEY,CA 94720
[2] UNIV CALIF BERKELEY,ELECTR RES LAB,BERKELEY,CA 94720
关键词
D O I
10.1002/pen.760170610
中图分类号
TQ [化学工业];
学科分类号
0817 ;
摘要
引用
收藏
页码:381 / 384
页数:4
相关论文
共 2 条
  • [1] MODELING PROJECTION PRINTING OF POSITIVE PHOTORESISTS
    DILL, FH
    NEUREUTHER, AR
    TUTTLE, JA
    WALKER, EJ
    [J]. IEEE TRANSACTIONS ON ELECTRON DEVICES, 1975, ED22 (07) : 456 - 464
  • [2] TUTTLE JA, 1972, COMMUNICATION JAN