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LINE-PROFILE RESIST DEVELOPMENT SIMULATION TECHNIQUES
被引:117
作者
:
JEWETT, RE
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV CALIF BERKELEY,DEPT ELECT ENGN & COMP SCI,BERKELEY,CA 94720
JEWETT, RE
HAGOUEL, PI
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV CALIF BERKELEY,DEPT ELECT ENGN & COMP SCI,BERKELEY,CA 94720
HAGOUEL, PI
NEUREUTHER, AR
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV CALIF BERKELEY,DEPT ELECT ENGN & COMP SCI,BERKELEY,CA 94720
NEUREUTHER, AR
VANDUZER, T
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV CALIF BERKELEY,DEPT ELECT ENGN & COMP SCI,BERKELEY,CA 94720
VANDUZER, T
机构
:
[1]
UNIV CALIF BERKELEY,DEPT ELECT ENGN & COMP SCI,BERKELEY,CA 94720
[2]
UNIV CALIF BERKELEY,ELECTR RES LAB,BERKELEY,CA 94720
来源
:
POLYMER ENGINEERING AND SCIENCE
|
1977年
/ 17卷
/ 06期
关键词
:
D O I
:
10.1002/pen.760170610
中图分类号
:
TQ [化学工业];
学科分类号
:
0817 ;
摘要
:
引用
收藏
页码:381 / 384
页数:4
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[J].
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共 2 条
[1]
MODELING PROJECTION PRINTING OF POSITIVE PHOTORESISTS
DILL, FH
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0
引用数:
0
h-index:
0
机构:
IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HEIGHTS,NY 10598
DILL, FH
NEUREUTHER, AR
论文数:
0
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0
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机构:
IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HEIGHTS,NY 10598
NEUREUTHER, AR
TUTTLE, JA
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0
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0
h-index:
0
机构:
IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HEIGHTS,NY 10598
TUTTLE, JA
WALKER, EJ
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HEIGHTS,NY 10598
WALKER, EJ
[J].
IEEE TRANSACTIONS ON ELECTRON DEVICES,
1975,
ED22
(07)
: 456
-
464
[2]
TUTTLE JA, 1972, COMMUNICATION JAN
←
1
→