LOW-ENERGY ELECTRON-MICROSCOPY

被引：0
|
作者：
BAUER, E
TELIEPS, W
TURNER, G
机构：
来源：
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1988年 / 6卷 / 03期
关键词：
D O I：
暂无
中图分类号：
TB3 [工程材料学];
学科分类号：
0805 ; 080502 ;
摘要：
引用
收藏
页码：573 / 574
页数：2
相关论文
共 50 条
  • [1] LOW-ENERGY ELECTRON-MICROSCOPY
    BAUER, E
    TELIEPS, W
    SCANNING MICROSCOPY, 1987, : 99 - 108
  • [2] LOW-ENERGY ELECTRON-MICROSCOPY
    BAUER, E
    MUNDSCHAU, M
    SWIECH, W
    TELIEPS, W
    EUREM 88, VOLS 1-3: TUTORIALS, INSTRUMENTATION AND TECHNIQUES / PHYSICS AND MATERIALS / BIOLOGY, 1988, 93 : 213 - 218
  • [3] LOW-ENERGY ELECTRON-MICROSCOPY
    BAUER, E
    MUNDSCHAU, M
    SWIECH, W
    TELIEPS, W
    INSTITUTE OF PHYSICS CONFERENCE SERIES, 1988, (93): : 213 - 218
  • [4] LOW-ENERGY ELECTRON-MICROSCOPY OF SURFACES
    TELIEPS, W
    BAUER, E
    SURFACE SCIENCE, 1988, 200 (2-3) : 512 - 513
  • [5] LOW-ENERGY ELECTRON-MICROSCOPY (LEEM)
    BAUER, E
    MUNDSCHAU, M
    SWIECH, W
    TELIEPS, W
    ULTRAMICROSCOPY, 1990, 32 (02) : 188 - 188
  • [6] SCANNING LOW-ENERGY ELECTRON-MICROSCOPY
    ICHINOKAWA, T
    ISHIKAWA, Y
    KEMMOCHI, M
    IKEDA, N
    HOSOKAWA, Y
    KIRSCHNER, J
    SCANNING MICROSCOPY, 1987, : 93 - 97
  • [7] LOW-ENERGY SCANNING ELECTRON-MICROSCOPY COMBINED WITH LOW-ENERGY ELECTRON-DIFFRACTION
    ICHINOKAWA, T
    ISHIKAWA, Y
    KEMMOCHI, M
    IKEDA, N
    HOSOKAWA, Y
    KIRSCHNER, J
    SURFACE SCIENCE, 1986, 176 (1-2) : 397 - 414
  • [8] LOW-ENERGY ELECTRON-MICROSCOPY OF SEMICONDUCTOR SURFACES
    BAUER, E
    MUNDSCHAU, M
    SWIECH, W
    TELIEPS, W
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1991, 9 (03): : 1007 - 1013
  • [9] LOW-ENERGY ELECTRON-MICROSCOPY OF SURFACE PROCESSES
    BAUER, E
    APPLIED SURFACE SCIENCE, 1992, 60-1 : 350 - 358
  • [10] LOW-ENERGY ELECTRON-MICROSCOPY OF NANOMETER SCALE PHENOMENA
    BAUER, E
    MUNDSCHAU, M
    SWIECH, W
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1991, 9 (02): : 403 - 408
12345