PROXIMITY EFFECT CORRECTION DATA-PROCESSING SYSTEM FOR ELECTRON-BEAM LITHOGRAPHY (VOL 10, PG 133, 1992)

被引：0
|
作者：
LU, W
TAO, JX
GU, N
机构：
来源：
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1993年 / 11卷 / 05期
关键词：
D O I：
10.1116/1.586520
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
引用
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页码：1906 / 1907
页数：2
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