PROXIMITY EFFECT CORRECTION DATA-PROCESSING SYSTEM FOR ELECTRON-BEAM LITHOGRAPHY (VOL 10, PG 133, 1992)

被引：0
|
作者：
LU, W
TAO, JX
GU, N
机构：
来源：
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1993年 / 11卷 / 05期
关键词：
D O I：
10.1116/1.586520
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
引用
收藏
页码：1906 / 1907
页数：2
相关论文
共 50 条
  • [1] PROXIMITY EFFECT CORRECTION DATA-PROCESSING SYSTEM FOR ELECTRON-BEAM LITHOGRAPHY
    HARAFUJI, K
    MISAKA, A
    KAWAKITA, K
    NOMURA, N
    HAMAGUCHI, H
    KAWAMOTO, M
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1992, 10 (01): : 133 - 142
  • [2] DATA-PROCESSING SYSTEM FOR ELECTRON-BEAM LITHOGRAPHY
    SUGIYAMA, N
    KAWAJI, A
    TARUI, Y
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1978, 125 (03) : C157 - C157
  • [3] DATA-PROCESSING SYSTEM OF ELECTRON-BEAM LITHOGRAPHY FOR VLSI MICROFABRICATION
    SUGIYAMA, N
    KAWAJI, A
    TARUI, Y
    IEEE TRANSACTIONS ON ELECTRON DEVICES, 1979, 26 (04) : 675 - 685
  • [4] PROXIMITY EFFECT CORRECTION IN ELECTRON-BEAM LITHOGRAPHY
    OWEN, G
    OPTICAL ENGINEERING, 1993, 32 (10) : 2446 - 2451
  • [5] PROXIMITY EFFECT CORRECTION IN ELECTRON-BEAM LITHOGRAPHY
    MACHIDA, Y
    NAKAYAMA, N
    HISATSUGU, T
    FUJITSU SCIENTIFIC & TECHNICAL JOURNAL, 1980, 16 (03): : 99 - 113
  • [6] PROXIMITY EFFECT CORRECTION IN ELECTRON-BEAM LITHOGRAPHY
    WITTELS, ND
    YOUNGMAN, CI
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1978, 125 (03) : C158 - C158
  • [7] PROXIMITY EFFECT CORRECTION IN ELECTRON-BEAM LITHOGRAPHY
    KATO, T
    WATAKABE, Y
    NAKATA, H
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1981, 19 (04): : 1279 - 1285
  • [8] STRATEGY FOR THE CORRECTION OF THE PROXIMITY EFFECT IN ELECTRON-BEAM LITHOGRAPHY
    HUBNER, H
    MICROELECTRONIC ENGINEERING, 1992, 18 (04) : 275 - 293
  • [9] PROXIMITY-EFFECT CORRECTION IN ELECTRON-BEAM LITHOGRAPHY
    VERMEULEN, P
    JONCKHEERE, R
    VANDENHOVE, L
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1989, 7 (06): : 1556 - 1560
  • [10] High-speed proximity effect correction system for electron-beam projection lithography by cluster processing
    Ogino, K
    Hoshino, H
    Machida, Y
    Osawa, M
    Arimoto, H
    Takahashi, K
    Yamashita, H
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 2003, 42 (6B): : 3827 - 3832
12345