FURTHER EXAMINATION OF THE SI KLL AUGER LINE IN SILICON-NITRIDE THIN-FILMS

被引：138
作者：
TAYLOR, JA
机构：
来源：
APPLIED SURFACE SCIENCE | 1981年 / 7卷 / 1-2期
关键词：
D O I：
10.1016/0378-5963(81)90068-4
中图分类号：
O64 [物理化学（理论化学）、化学物理学];
学科分类号：
070304 ; 081704 ;
摘要：
引用
收藏
页码：168 / 184
页数：17
相关论文
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