PATTERN-FORMATION AND PHOTOPHYSICAL APPLICATIONS OF LANGMUIR-BLODGETT MULTILAYERS BASED ON POLYGLUTAMATES

被引:24
作者
MATHAUER, K [1 ]
MATHY, A [1 ]
BUBECK, C [1 ]
WEGNER, G [1 ]
HICKEL, W [1 ]
SCHEUNEMANN, U [1 ]
机构
[1] HOECHST AG, W-6230 FRANKFURT 80, GERMANY
关键词
D O I
10.1016/0040-6090(92)90308-X
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Langmuir-Blodgett multilayers from ternary copolymers of gamma-methyl-, gamma-octadecyl-, and gamma-(ll-cinnamoylundec-l-yl)-L-glutamate were prepared. Pattern formation by UV irradiation through a mask and by electron beam is demonstrated. Optical loss measurements on waveguiding films (500 layers/thickness 870 nm) yielded an attenuation of 3.6 dB/cm at 633 nm.
引用
收藏
页码:449 / 451
页数:3
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