ACTIVATION-ENERGY AND SATURATION DENSITY FOR IN AND SN THIN-FILMS ON NAC1 SUBSTRATES

被引：4

|

作者：

SINGH, HP

MURR, LE

机构：

来源：

SCRIPTA METALLURGICA | 1972年 / 6卷 / 04期

关键词：

D O I：

10.1016/0036-9748(72)90118-4

中图分类号：

TF [冶金工业];

学科分类号：

0806 ;

摘要：

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页码：333 / &

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