Plasma Technology 4.0 State of the Art, Developments and Expectations

被引：0

作者：

Ferse, Katrin ^{[1
]}

Awakowicz, Peter ^{[2
]}

Beck, Uwe ^{[3
]}

Brand, Carola ^{[4
]}

Engelstaedter, Jan Peter ^{[5
]}

Fiedler, Wilfriede ^{[6
]}

Foest, Ruediger ^{[7
]}

Kersten, Holger ^{[8
]}

Lemmer, Oliver ^{[9
]}

Schaefer, Hans-Jurgen ^{[10
]}

Schwock, Alexander ^{[11
]}

机构：

[1] Europa Forsch Gesell Dunne Schichten eV, Gostritzer Str 63, D-01217 Dresden, Germany

[2] Ruhr Univ Bochum, Bochum, Germany

[3] Bundesanstalt Mat Forsch & Prufung BAM, Berlin, Germany

[4] INPLAS Kompetenznetz Ind Plasma Oberflachentech e, Braunschweig, Germany

[5] TRUMPF Huttinger GmbH Co KG, Freiburg, Germany

[6] VACOM Vakuum Komponenten & Messtech GmbH, Grosslobichau, Germany

[7] Leibniz Inst Plasmaforsch & Technol eV INP, Greifswald, Germany

[8] Univ Kiel, Kiel, Germany

[9] CemeCon AG, Wurselen, Germany

[10] Verein Deutsch Ingenieure eV, Dusseldorf, Germany

[11] Balt Net PlasmaTec eV, Greifswald, Germany

来源：

VAKUUM IN FORSCHUNG UND PRAXIS | 2018年 / 30卷 / 06期

关键词：

D O I：

10.1002/vipr.201800697

中图分类号：

TH [机械、仪表工业];

学科分类号：

0802 ;

摘要：

Zusammenfassung Plasma Technology 4.0 - State of the art, developments and expectations New technologies offer great opportunities for plasma applications. This fact is also known by the players in surface technology who deal intensively with these current topics. In everyday practice there are already good examples of integrable IoT services for process technology right through to networked business processes. The expectations are high and the concerns as well. Beginning with social aspects of the man-machine interface through standardization to cyber security there are numerous topics that are discussed in the community. The potential of the plasma technology drives the stakeholders and inspires to more and more new research projects for intelligent process diagnostics and process control.

引用

页码：34 / 39

页数：6

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