CHARACTERISTICS OF DELTA-DOPED INGAAS/GAAS PSEUDOMORPHIC DOUBLE-QUANTUM-WELL HIGH-ELECTRON-MOBILITY TRANSISTORS

被引:2
作者
HSU, RT
KAO, MJ
WANG, JS
HSU, WC
机构
[1] Natl Cheng Kung Univ, Tainan
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1995年 / 13卷 / 02期
关键词
D O I
10.1116/1.588363
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
δ-doped InGaAs/GaAs pseudomorphic double-quantum-well high electron mobility transistors grown by low pressure metalorganic chemical vapor deposition are fabricated and demonstrated. The heterostructure with 2 μm gate length and 100 angstrom channel spacer thickness shows a peak extrinsic transconductance and a maximum saturation current density of 121 mS/mm and 423 mA/mm at 300 K, respectively. Meanwhile, an interesting broad twin-peak transconductance plateau (approx.4 V) is observed.
引用
收藏
页码:273 / 275
页数:3
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