INVESTIGATION OF THERMAL-STABILITY OF MULTILAYERED SI/TISI2-AL AND SI/TISI2(TIN)-W-AL SYSTEMS

被引：0

作者：

KISELEV, NA ^{[1
]}

LEBEDEV, OI ^{[1
]}

ORLIKOVSKY, AA ^{[1
]}

SEDELNIKOV, AE ^{[1
]}

VALIEV, KA ^{[1
]}

VASILIEV, AG ^{[1
]}

VASILIEV, AL ^{[1
]}

机构：

[1] RUSSIAN ACAD SCI,INST PHYS & TECHNOL,MOSCOW,RUSSIA

来源：

VACUUM | 1993年 / 44卷 / 10期

关键词：

D O I：

10.1016/0042-207X(93)90290-Q

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

In this paper an investigation of the multilayered Si/TiSi2-Al and Si/TiSi2 (TiN)-W-Al systems are reported. Transmission electron microscopy (TEM), X-ray microanalysis and Rutherford backscattering spectroscopy (RBS) were used to estimate the effect of formation conditions and annealing on layer content, mutual diffusion and interface structure. The most thermally stable multilayered systems were revealed.

引用

页码：1015 / 1023

页数：9

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