FREE-STANDING PHOTORESIST FILMS FOR MICROLITHOGRAPHY

被引：1
|
作者：
LITTLE, JW [1 ]
CALLCOTT, TA [1 ]
ARAKAWA, ET [1 ]
机构：
[1] OAK RIDGE NATL LAB,DIV HLTH & SAFETY RES,OAK RIDGE,TN 37830
来源：
REVIEW OF SCIENTIFIC INSTRUMENTS | 1980年 / 51卷 / 11期
关键词：
D O I：
10.1063/1.1136106
中图分类号：
TH7 [仪器、仪表];
学科分类号：
0804 ; 080401 ; 081102 ;
摘要：
引用
收藏
页码：1581 / 1583
页数：3
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