FREE-STANDING PHOTORESIST FILMS FOR MICROLITHOGRAPHY

被引:1
|
作者
LITTLE, JW [1 ]
CALLCOTT, TA [1 ]
ARAKAWA, ET [1 ]
机构
[1] OAK RIDGE NATL LAB,DIV HLTH & SAFETY RES,OAK RIDGE,TN 37830
来源
REVIEW OF SCIENTIFIC INSTRUMENTS | 1980年 / 51卷 / 11期
关键词
D O I
10.1063/1.1136106
中图分类号
TH7 [仪器、仪表];
学科分类号
0804 ; 080401 ; 081102 ;
摘要
引用
收藏
页码:1581 / 1583
页数:3
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