STATISTICS GOVERNING DEFECT DENSITY DETERMINATION IN SIO2 FILMS

被引：5

作者：

CHOU, NJ ^{[1
]}

ELDRIDGE, JM ^{[1
]}

机构：

[1] IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598

来源：

关键词：

D O I：

10.1149/1.2403648

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

页码：1139 / 1140

页数：2

共 6 条

CHOU, NJ ;

ELDRIDGE, JM .

[2]

FRITZSCHE C, 1967, Z ANGEW PHYSIK, V24, P48

[3] DEVITRIFICATION OF STEAM-GROWN SILICON DIOXIDE FILMS [J].

MEEK, RL ;

BRAUN, RH .

OSBURN, CM ;

ORMOND, DW .

[5] A NEW LOOK AT YIELD OF INTEGRATED CIRCUITS [J].

PRICE, JE .

PROCEEDINGS OF THE INSTITUTE OF ELECTRICAL AND ELECTRONICS ENGINEERS, 1970, 58 (08) :1290-&

[6]

WHITHEAD S, 1951, DIELECTRIC BREAKDOWN