DATA-PROCESSING SYSTEM OF ELECTRON-BEAM LITHOGRAPHY FOR VLSI MICROFABRICATION

被引：9
|
作者：
SUGIYAMA, N
KAWAJI, A
TARUI, Y
机构：
来源：
IEEE TRANSACTIONS ON ELECTRON DEVICES | 1979年 / 26卷 / 04期
关键词：
D O I：
10.1109/T-ED.1979.19476
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
引用
收藏
页码：675 / 685
页数：11
相关论文
共 50 条
  • [41] THE RESOLUTION OF ELECTRON-BEAM LITHOGRAPHY
    LUTWYCHE, MI
    MICROELECTRONIC ENGINEERING, 1992, 17 (1-4) : 17 - 20
  • [42] INSTRUMENTATION FOR ELECTRON-BEAM LITHOGRAPHY
    CHANG, THP
    SOLID STATE TECHNOLOGY, 1975, 18 (07) : 33 - 37
  • [43] RESISTS FOR ELECTRON-BEAM LITHOGRAPHY
    TAMAMURA, T
    IMAMURA, S
    SUGAWARA, S
    ACS SYMPOSIUM SERIES, 1984, 242 : 103 - 118
  • [44] INSTRUMENTATION FOR ELECTRON-BEAM LITHOGRAPHY
    CHANG, THP
    IEEE TRANSACTIONS ON MAGNETICS, 1974, MA10 (03) : 883 - 887
  • [45] ELECTRON-BEAM ARRAY LITHOGRAPHY
    SMITH, DO
    HARTE, KJ
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1981, 19 (04): : 953 - 957
  • [46] A HIGH-SPEED ELECTRON-BEAM LITHOGRAPHY SYSTEM
    EIDSON, JC
    SCUDDER, RK
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1981, 19 (04): : 932 - 935
  • [47] SOFTWARE CONTROL FOR THE HP ELECTRON-BEAM LITHOGRAPHY SYSTEM
    HAMILTON, B
    HEWLETT-PACKARD JOURNAL, 1981, 32 (05): : 21 - 23
  • [48] LSI AND ELECTRON-BEAM LITHOGRAPHY
    LIVESAY, WR
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1975, 122 (03) : C86 - C86
  • [49] ELECTRON-BEAM CELL-PROJECTION LITHOGRAPHY SYSTEM
    SAKITANI, Y
    YODA, H
    TODOKORO, H
    SHIBATA, Y
    YAMAZAKI, T
    OHBITU, K
    SAITOU, N
    MORIYAMA, S
    OKAZAKI, S
    MATUOKA, G
    MURAI, F
    OKUMURA, M
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1992, 10 (06): : 2759 - 2763
  • [50] ELECTRON-BEAM LITHOGRAPHY SYSTEM USING A QUADRUPOLE TRIPLET
    OKAYAMA, S
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1988, 6 (01): : 199 - 203
12345