DATA-PROCESSING SYSTEM OF ELECTRON-BEAM LITHOGRAPHY FOR VLSI MICROFABRICATION

被引:9
|
作者
SUGIYAMA, N
KAWAJI, A
TARUI, Y
机构
关键词
D O I
10.1109/T-ED.1979.19476
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
引用
收藏
页码:675 / 685
页数:11
相关论文
共 50 条
  • [1] DATA-PROCESSING SYSTEM FOR ELECTRON-BEAM LITHOGRAPHY
    SUGIYAMA, N
    KAWAJI, A
    TARUI, Y
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1978, 125 (03) : C157 - C157
  • [2] PROXIMITY EFFECT CORRECTION DATA-PROCESSING SYSTEM FOR ELECTRON-BEAM LITHOGRAPHY
    HARAFUJI, K
    MISAKA, A
    KAWAKITA, K
    NOMURA, N
    HAMAGUCHI, H
    KAWAMOTO, M
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1992, 10 (01): : 133 - 142
  • [3] AN ELECTRON-BEAM MICROFABRICATION SYSTEM FOR LITHOGRAPHY BELOW 1000A
    COANE, PJ
    KERN, DP
    SPETH, A
    CHANGE, THP
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1982, 129 (03) : C110 - C110
  • [4] PROXIMITY EFFECT CORRECTION DATA-PROCESSING SYSTEM FOR ELECTRON-BEAM LITHOGRAPHY (VOL 10, PG 133, 1992)
    LU, W
    TAO, JX
    GU, N
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1993, 11 (05): : 1906 - 1907
  • [5] EBCAD - FULLY INTEGRATED PATTERN DATA-PROCESSING FOR DIRECT WRITE ELECTRON-BEAM LITHOGRAPHY SYSTEMS
    OTTO, OW
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1981, 19 (04): : 993 - 997
  • [6] MODULAR SYSTEM FOR ELECTRON-BEAM MICROFABRICATION
    YEW, NC
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1974, 121 (03) : C109 - C109
  • [7] ADVANCED PATTERN DATA-PROCESSING TECHNIQUE FOR A RASTER SCAN ELECTRON-BEAM EXPOSURE SYSTEM
    KOYAMA, K
    SASAKI, S
    TOKITA, M
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1981, 19 (04): : 988 - 992
  • [8] ELECTRON-BEAM MICROFABRICATION - PROSPECTS FOR A PRACTICAL SYSTEM
    CHARMAN, PA
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1973, 10 (06): : 1132 - 1132
  • [9] DIGITAL PROCESSING OF BEAM SIGNALS IN A VARIABLY SHAPED ELECTRON-BEAM LITHOGRAPHY SYSTEM
    MATSUOKA, G
    YOKOUCHI, H
    OKUMURA, M
    MATSUZAKA, T
    SAITOU, N
    NAKAMURA, K
    PROCEEDINGS OF THE SOCIETY OF PHOTO-OPTICAL INSTRUMENTATION ENGINEERS, 1985, 537 : 34 - 41
  • [10] MOS AND BIPOLAR VLSI TECHNOLOGIES USING ELECTRON-BEAM LITHOGRAPHY
    VARNELL, GL
    SHAH, PL
    HAVEMANN, RH
    PROCEEDINGS OF THE IEEE, 1983, 71 (05) : 612 - 639