DEPOSITION OF DIAMOND-LIKE CARBON-FILMS USING ELECTRON-CYCLOTRON-RESONANCE PLASMA CHEMICAL-VAPOR-DEPOSITION FROM ETHYLENE GAS

被引：28

作者：

SUZUKI, J ^{[1
]}

OKADA, S ^{[1
]}

机构：

[1] SHIMADZU CO LTD, DIV AIRCRAFT EQUIPMENT, NAKAGYO KU, KYOTO 604, JAPAN

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS | 1995年 / 34卷 / 9B期

关键词：

DIAMOND-LIKE CARBON FILMS; ECR; ETHYLENE; CVD; RAMAN SPECTROSCOPY; KNOOP HARDNESS; ERDA;

D O I：

10.1143/JJAP.34.L1218

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Diamondlike carbon films have been prepared by RF bias electron cyclotron resonance (ECR) microwave plasma deposition from ethylene gas. The relationship between the properties of diamondlike carbon films and process parameters has been investigated. These films were evaluated in terms of Knoop hardness, Raman spectroscopy and hydrogen content measured by an elastic recoil detection analysis (ERDA) method. As the microwave power becomes higher, the hardness of the films tends to increase. This trend is different from that observed in the deposition of methane gas.

引用

页码：L1218 / L1220

页数：3

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