CHEMICALLY VAPOR-DEPOSITED POLYCRYSTALLINE-SILICON FILMS

被引：38
作者：
KAMINS, TI [1 ]
机构：
[1] FAIRCHILD SEMICONDUCTOR,RES & DEV LAB,PALO ALTO,CA 94304
来源：
IEEE TRANSACTIONS ON PARTS HYBRIDS AND PACKAGING | 1974年 / PH10卷 / 04期
关键词：
D O I：
10.1109/TPHP.1974.1134872
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
引用
收藏
页码：221 / 229
页数：9
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