PREFERENTIAL SPUTTERING OF PTSI, NISI2, AND AGAU

被引：41
作者：
HOLLOWAY, PH
BHATTACHARYA, RS
机构：
来源：
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1982年 / 20卷 / 03期
关键词：
D O I：
10.1116/1.571330
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
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页码：444 / 448
页数：5
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