THE EFFECT OF ALUMINUM MASKS ON THE PLASMA ETCH RATES OF POLYSILICON AND SILICON-NITRIDE

被引：5

作者：

GRYNKEWICH, GW ^{[1
]}

FEDYNYSHYN, TH ^{[1
]}

DUMAS, RH ^{[1
]}

机构：

[1] OLIN RES CTR,CHESHIRE,CT 06410

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1990年 / 8卷 / 01期

关键词：

D O I：

10.1116/1.584829

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

页码：5 / 9

页数：5

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