SIZING ACCURACY, COUNTING EFFICIENCY, LOWER DETECTION LIMIT AND REPEATABILITY OF A WAFER SURFACE SCANNER FOR IDEAL AND REAL-WORLD PARTICLES

被引:14
作者
LIU, BYH [1 ]
CHAE, SK [1 ]
BAE, GN [1 ]
机构
[1] KOREA ADV INST SCI & TECHNOL,THERMAL FLUID ENGN LAB,SEOUL 131,SOUTH KOREA
关键词
D O I
10.1149/1.2221569
中图分类号
O646 [电化学、电解、磁化学];
学科分类号
081704 ;
摘要
The performance characteristics of a Tencor Surfscan 4000 wafer surface scanner have been evaluated using ideal polystyrene latex (PSL) spheres and irregularly shaped real-world particles of Si and SiO2. The particles were uniform in size and were deposited on bare silicon wafers and used as standard calibration wafers to study the scanner response. Particles in the 0.1 to 1.0 mum diam range were used. The sizing accuracy, counting efficiency, lower detection limit, and count repeatability of the scanner were studied systematically. The full Maxwell's electromagnetic equations also have been solved numerically on a supercomputer to obtain the light-scattering cross section of the particles on bare silicon wafers. The calculation compares favorably with the experimental results. Because of the high refractive index of silicon, the wafer surf ace scanner detects Si particles to a considerably smaller size than PSL. The data suggest that Si particles as small as 0.1 mum have been detected by the Surfscan 4000 with 90% counting efficiency even though the nominal lower limit of the instrument is 0.3 mum based on PSL calibration.
引用
收藏
页码:1403 / 1409
页数:7
相关论文
共 9 条
[1]  
CHAE SK, 1992, 38TH P I ENV SCI ANN, V1, P271
[2]  
CHAE SK, 1991, THESIS U MINNESOTA M
[3]   ESTIMATING AN INSTRUMENTS COUNTING EFFICIENCY BY REPEATED MEASUREMENTS OF ONE SAMPLE [J].
COOPER, DW ;
NEUKERMANS, A .
JOURNAL OF COLLOID AND INTERFACE SCIENCE, 1991, 147 (01) :98-102
[4]  
GRANT D, 1992, 38TH P I ENV SCI ANN, V1, P196
[5]   THEORETICAL AND EXPERIMENTAL PARTICLE-SIZE RESPONSE OF WAFER SURFACE SCANNERS [J].
LEE, HOS ;
CHAE, SK ;
YE, Y ;
PUI, DYH ;
WOJCIK, GL .
AEROSOL SCIENCE AND TECHNOLOGY, 1991, 14 (02) :177-192
[6]  
PECEN J, 1987, SOLID STATE TECHNOL, V30, P149
[7]   EXPERIMENTAL-STUDY OF PARTICLE DEPOSITION ON SEMICONDUCTOR WAFERS [J].
PUI, DYH ;
YE, Y ;
LIU, BYH .
AEROSOL SCIENCE AND TECHNOLOGY, 1990, 12 (04) :795-804
[8]  
TULLIS BJ, 1988, HDB CONTAMINATION CO
[9]  
WOJCIK GL, 1987, SPIE, V774, P21