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GAAS MICROWAVE MOSFETS
被引:47
作者
:
MIMURA, T
论文数:
0
引用数:
0
h-index:
0
MIMURA, T
ODANI, K
论文数:
0
引用数:
0
h-index:
0
ODANI, K
YOKOYAMA, N
论文数:
0
引用数:
0
h-index:
0
YOKOYAMA, N
NAKAYAMA, Y
论文数:
0
引用数:
0
h-index:
0
NAKAYAMA, Y
FUKUTA, M
论文数:
0
引用数:
0
h-index:
0
FUKUTA, M
机构
:
来源
:
IEEE TRANSACTIONS ON ELECTRON DEVICES
|
1978年
/ 25卷
/ 06期
关键词
:
D O I
:
10.1109/T-ED.1978.19139
中图分类号
:
TM [电工技术];
TN [电子技术、通信技术];
学科分类号
:
0808 ;
0809 ;
摘要
:
引用
收藏
页码:573 / 579
页数:7
相关论文
共 16 条
[11]
Mason S.J., 1954, IRE T CIRCUIT THEORY, VCT-1, P20, DOI DOI 10.1109/TCT.1954.1083579
[12]
MIMURA T, 1977, 9TH C SOL STAT DEV T
[13]
SUBMICRON GAAS EPITAXIAL LAYER FROM DIETHYLGALLIUMCHLORIDE AND ARSINE
NAKAYAMA, Y
论文数:
0
引用数:
0
h-index:
0
机构:
FUJITSU LABS LTD,NAKAHARA KU,KAWASAKI 211,JAPAN
FUJITSU LABS LTD,NAKAHARA KU,KAWASAKI 211,JAPAN
NAKAYAMA, Y
OHKAWA, S
论文数:
0
引用数:
0
h-index:
0
机构:
FUJITSU LABS LTD,NAKAHARA KU,KAWASAKI 211,JAPAN
FUJITSU LABS LTD,NAKAHARA KU,KAWASAKI 211,JAPAN
OHKAWA, S
HASHIMOTO, H
论文数:
0
引用数:
0
h-index:
0
机构:
FUJITSU LABS LTD,NAKAHARA KU,KAWASAKI 211,JAPAN
FUJITSU LABS LTD,NAKAHARA KU,KAWASAKI 211,JAPAN
HASHIMOTO, H
ISHIKAWA, H
论文数:
0
引用数:
0
h-index:
0
机构:
FUJITSU LABS LTD,NAKAHARA KU,KAWASAKI 211,JAPAN
FUJITSU LABS LTD,NAKAHARA KU,KAWASAKI 211,JAPAN
ISHIKAWA, H
[J].
JOURNAL OF THE ELECTROCHEMICAL SOCIETY,
1976,
123
(08)
: 1227
-
1231
[14]
REDDI VGK, 1968, IEEE T ELECTRON DEV, VED15, P151
[15]
MICROWAVE PROPERTIES OF SCHOTTKY-BARRIER FIELD-EFFECT TRANSISTORS
WOLF, P
论文数:
0
引用数:
0
h-index:
0
WOLF, P
[J].
IBM JOURNAL OF RESEARCH AND DEVELOPMENT,
1970,
14
(02)
: 125
-
+
[16]
YOKOYAMA N, UNPUBLISHED
←
1
2
→
共 16 条
[11]
Mason S.J., 1954, IRE T CIRCUIT THEORY, VCT-1, P20, DOI DOI 10.1109/TCT.1954.1083579
[12]
MIMURA T, 1977, 9TH C SOL STAT DEV T
[13]
SUBMICRON GAAS EPITAXIAL LAYER FROM DIETHYLGALLIUMCHLORIDE AND ARSINE
NAKAYAMA, Y
论文数:
0
引用数:
0
h-index:
0
机构:
FUJITSU LABS LTD,NAKAHARA KU,KAWASAKI 211,JAPAN
FUJITSU LABS LTD,NAKAHARA KU,KAWASAKI 211,JAPAN
NAKAYAMA, Y
OHKAWA, S
论文数:
0
引用数:
0
h-index:
0
机构:
FUJITSU LABS LTD,NAKAHARA KU,KAWASAKI 211,JAPAN
FUJITSU LABS LTD,NAKAHARA KU,KAWASAKI 211,JAPAN
OHKAWA, S
HASHIMOTO, H
论文数:
0
引用数:
0
h-index:
0
机构:
FUJITSU LABS LTD,NAKAHARA KU,KAWASAKI 211,JAPAN
FUJITSU LABS LTD,NAKAHARA KU,KAWASAKI 211,JAPAN
HASHIMOTO, H
ISHIKAWA, H
论文数:
0
引用数:
0
h-index:
0
机构:
FUJITSU LABS LTD,NAKAHARA KU,KAWASAKI 211,JAPAN
FUJITSU LABS LTD,NAKAHARA KU,KAWASAKI 211,JAPAN
ISHIKAWA, H
[J].
JOURNAL OF THE ELECTROCHEMICAL SOCIETY,
1976,
123
(08)
: 1227
-
1231
[14]
REDDI VGK, 1968, IEEE T ELECTRON DEV, VED15, P151
[15]
MICROWAVE PROPERTIES OF SCHOTTKY-BARRIER FIELD-EFFECT TRANSISTORS
WOLF, P
论文数:
0
引用数:
0
h-index:
0
WOLF, P
[J].
IBM JOURNAL OF RESEARCH AND DEVELOPMENT,
1970,
14
(02)
: 125
-
+
[16]
YOKOYAMA N, UNPUBLISHED
←
1
2
→