A PHOTOEMISSION INVESTIGATION OF SURFACE PROCESSES AFFECTING THE REACTIVE ION ETCHING OF TISI2 IN CF4

被引：15

作者：

ROBEY, SW

JASO, MA

OEHRLEIN, GS

机构：

来源：

JOURNAL OF APPLIED PHYSICS | 1989年 / 65卷 / 08期

关键词：

D O I：

10.1063/1.342742

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：2951 / 2956

页数：6

共 12 条

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