OPTICAL SPECTROSCOPY FOR DIAGNOSTICS AND PROCESS-CONTROL DURING GLOW-DISCHARGE ETCHING AND SPUTTER DEPOSITION

被引：93

作者：

GREENE, JE

机构：

[1] UNIV ILLINOIS,DEPT MECH ENGN,URBANA,IL 61801

[2] UNIV ILLINOIS,COORDINATED SCI LAB,URBANA,IL 61801

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1978年 / 15卷 / 05期

关键词：

D O I：

10.1116/1.569834

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：1718 / 1729

页数：12

共 38 条

[1]

Aston FW, 1907, P R SOC LOND A-CONTA, V79, P80, DOI 10.1098/rspa.1907.0016

[2] SPECTROSCOPIC MONITOR FOR SPUTTER-ETCHING PROCESSES [J].

BERNSTEIN, T ;

LABUDA, EF .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1973, 10 (01) :108-110

[3] CONCENTRATION PROFILES AND SPUTTERING YIELDS MEASURED BY OPTICAL RADIATION OF SPUTTERED PARTICLES [J].

BRAUN, M ;

EMMOTH, B ;

BUCHTA, R .

RADIATION EFFECTS AND DEFECTS IN SOLIDS, 1976, 28 (1-2) :77-83

[4]

CLEMENTS RM, 1978, J VAC SCI TECHNOL, V15, P193, DOI 10.1116/1.569453

[5]

Cobine JD, 1958, GASEOUS CONDUCTORS T, V1st, DOI DOI 10.1016/S0016-0032(42)90330-2

[6] ION-SURFACE INTERACTIONS IN PLASMA ETCHING [J].

COBURN, JW ;

WINTERS, HF ;

CHUANG, TJ .

JOURNAL OF APPLIED PHYSICS, 1977, 48 (08) :3532-3540

[7] GLOW-DISCHARGE MASS-SPECTROMETRY - TECHNIQUE FOR DETERMINING ELEMENTAL COMPOSITION PROFILES IN SOLIDS [J].

COBURN, JW ;

TAGLAUER, E ;

KAY, E .

JOURNAL OF APPLIED PHYSICS, 1974, 45 (04) :1779-1786

[8] ION ENERGIES AT CATHODE OF A GLOW DISCHARGE [J].

DAVIS, WD ;

VANDERSLICE, TA .

PHYSICAL REVIEW, 1963, 131 (01) :219-&

[9] SPECTROSCOPIC STUDY OF RADIOFREQUENCY OXYGEN PLASMA STRIPPING OF NEGATIVE PHOTORESISTS .1. ULTRAVIOLET-SPECTRUM [J].

DEGENKOLB, EO ;

MOGAB, CJ ;

GOLDRICK, MR ;

GRIFFITHS, JE .

APPLIED SPECTROSCOPY, 1976, 30 (05) :520-527

[10]

FRANCIS G, 1956, HDB PHYSIK, V22, P53

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