FORMATION OF AMORPHOUS SILICIDE NANOCLUSTERS IN CHROMIUM-IMPLANTED AND TITANIUM-IMPLANTED SILICA

被引：16

作者：

CATTARUZZA, E

MATTEI, G

MAZZOLDI, P

BERTONCELLO, R

BATTAGLIN, G

MIRENGHI, L

机构：

[1] INFM,DIPARTIMENTO CHIM FIS,I-30123 VENICE,ITALY

[2] CNRSM,PASTIS,I-72100 BRINDISI,ITALY

[3] DIPARTIMENTO CIMA,I-35131 PADUA,ITALY

[4] CONSORZIO INCM,I-35131 PADUA,ITALY

来源：

APPLIED PHYSICS LETTERS | 1995年 / 67卷 / 19期

关键词：

D O I：

10.1063/1.114817

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Amorphous nanoclusters of chromium and titanium silicides have been synthesized by implanting 35 keV chromium and 30 keV titanium ions, at a fluence of 1X10(17) cm(-2) in amorphous silica. The cluster stoichiometries were [Cr]/[Si]=1.6+/-0.3 and [Ti]/[Si]=1.1+/-0.3, respectively, as obtained by energy dispersive spectroscopic x-ray microanalysis and confirmed by x-ray photoelectron spectroscopy analysis, Titanium-implanted ions are more reactive than chromium ones in terms of the formation of chemical bonds with silicon of the host silica matrix. (C) 1995 American Institute of Physics.

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页码：2884 / 2886

页数：3

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