ALTERATION OF NI SILICIDE FORMATION BY N IMPLANTATION

被引:20
作者
WIELUNSKI, L [1 ]
SCOTT, DM [1 ]
NICOLET, MA [1 ]
VONSEEFELD, H [1 ]
机构
[1] CALTECH,PASADENA,CA 91109
关键词
D O I
10.1063/1.92259
中图分类号
O59 [应用物理学];
学科分类号
摘要
引用
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页码:106 / 108
页数:3
相关论文
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APPLIED PHYSICS LETTERS, 1978, 33 (02) :187-190
[2]  
DEARNALEY G., 1973, ION IMPLANTATION
[3]   INFLUENCE OF NATURE OF SI SUBSTRATE ON NICKEL SILICIDE FORMED FROM THIN NI FILMS [J].
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MAYER, JW .
THIN SOLID FILMS, 1976, 38 (02) :143-150
[4]  
SCOTT DM, 1980, P S THIN FILM INTERF, V80, P148
[5]  
TU KN, 1975, THIN SOLID FILMS, V25, P402