LOW-TEMPERATURE REDISTRIBUTION OF AS IN SI DURING PD2SI FORMATION

被引：47
|
作者：
OHDOMARI, I
TU, KN
SUGURO, K
AKIYAMA, M
KIMURA, I
YONEDA, K
机构：
[1] IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598
[2] KYOTO UNIV,OSAKA,JAPAN
来源：
APPLIED PHYSICS LETTERS | 1981年 / 38卷 / 12期
关键词：
D O I：
10.1063/1.92250
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
引用
收藏
页码：1015 / 1017
页数：3
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