MODEL OF THE EPITAXIAL CHEMICAL VAPOR-DEPOSITION REACTOR FOR DESIGN AND PERFORMANCE OPTIMIZATION

被引：13
|
作者：
JUZA, J [1 ]
CERMAK, J [1 ]
机构：
[1] CZECHOSLOVAK ACAD SCI, INST CHEM PROC FUNDAMENTALS, CS-25068 PRAGUE, CZECHOSLOVAKIA
来源：
CHEMICAL ENGINEERING SCIENCE | 1980年 / 35卷 / 1-2期
关键词：
D O I：
10.1016/0009-2509(80)80116-3
中图分类号：
TQ [化学工业];
学科分类号：
0817 ;
摘要：
引用
收藏
页码：429 / 436
页数：8
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